A pH meter is laboratory equipment used to measure hydrogen ion activity (acidity or alkalinity) in solution.
The Potentiostat is an instrument that can apply a potential to a system and measure the resulting current. This is used to measure water splitting in phoelectrochemical (PEC) systems.
Dip coating is a film deposition technique, performed on substrates by immersion provided with a stepper motor, which, when moving the lever on which the substrate is fixed, allows it to be immersed and removed from the solution. The withdrawal speed can be controlled by a fine adjustment knob.
Electric field-assisted sintering system (flashsintesis) coupled to the furnace for measurements up to 500oC
Electrical characterization of the piezoelectric coefficients, together with a cryogenic system with a helium pump to lower the temperature from 20K to 400K, for impedance measurements with the dielectric interface.
Ferroelectric characterization system: polarization system in ferroelectric materials, electrostriction (mechanical hysteresis) and sawer tower circuit (ferroelectric hysteresis)
Furnaces for thermal treatment, annealing, sintering, etc.
The GC technique separates the different substances in a mixture using gas. This helps us to identify or quantify the different elements in the mixture.
Experimental setup for gas sensors characterization
High precision digital scale, used for weighing materials.
High temperature furnace up to 1700 °C.
Isostatic press for forming ceramic body up to 1 inch of diameter.
Mercury porosimeter, mainly used to measure soils.
Rheometer is the equipment that performs measurements of tension forces and shear rate on materials, determining the rheological behavior of materials.
Spin coating is a technique used to prepare films with uniform thickness.
Sputtering deposition is a physical vapor deposition method of thin film deposition and nanoparticles. This involves ejecting atoms and clusters from a target material to substrates such as silicon wafer, powder, and liquids.
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering.
Determination of specific surface area and porosity size by BET method.
System of CO2 laser for fast sintering.
UV–visible spectrophotometry dedicated to dye degradation photocatalysis.
UV–visible spectrophotometry (UV–Vis or UV/Vis) refers to absorption spectroscopy or reflectance spectroscopy in part of the ultraviolet and the full, adjacent visible regions of the electromagnetic spectrum. Parameters of interest, besides the wavelength of measurement, are absorbance (A) or transmittance (%T) or reflectance (%R), and its change with time.
The XPS technique is applied to the investigation of electronic structure (chemical information) of a broad range of materials such as metal, metal oxide semiconductors, etc.
The Ultima IV X-ray diffractometer has a general purpose for investigation of the crystal structure of semiconductor, metals, metal oxides materials, etc.
